Aim: To develop optimized Direct Laser Interference Patterning (DLIP) techniques for texturing thin film multilayer coatings, achieving precise and homogenous micro-patterns.

Brief description: This project focuses on utilizing DLIP technology to texture thin films coated on mica substrates, with materials such as pure carbon and carbon/gold composites. The goal was to produce uniform 1 µm holes with high homogeneity across the thin films. Various configurations and fluence levels were tested to achieve consistent patterning while minimizing issues like delamination and inhomogeneous overlap. Challenges identified include suboptimal beam overlap due to design tolerances in the optical setup, suggesting potential improvements in future iterations.

Benefits: DLIP technology offers a scalable and efficient solution for texturing thin films with precision, paving the way for applications in electronics, optics, and sensors. The insights gained into optimizing DLIP configurations enhance the potential for producing advanced materials with improved structural and functional properties.